LONDON, Feb. 20, 2019 /PRNewswire/ -- Sputtering Equipment Cathode Market Size, Share & Trends Analysis Report By Product (Linear, Circular), By Region (North America, Europe, Central & South America, ...
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The cathode holder disk is part of the NEC multi-cathode source of negative ions by cesium sputtering. Cathodes of 60 Fe samples and blank samples were installed on the holder disk. Researchers at the ...
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Able to meet the cathode voltage and power requirements for dc magnetron sputtering sources, the 600-W EK Series and 1.2-kW EQ Series with sputtering option provide from 0 to 800 W at 750 mA or 1.5 A, ...
THE cathodic sputtering process has been almost completely replaced in recent years by the vacuum evaporation technique for the production of thin solid films. However, renewed interest in the ...
Deposition tool vendor Tegal Corp. said today that it has been granted a U.S. patent for its flat magnetron sputter source. The invention, covered by U.S. patent no. 6,783,638, provides for the use of ...
High power magnetron sputtering techniques have become essential tools in the deposition of advanced thin films. By utilising high power pulses, these methods generate highly ionised plasmas that ...
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