TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...

Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

Then at Intel's Foundry Direct event in April, Intel's chief technology and operations officer Naga Chandrasekaran stated ...

The SPIE Advanced Lithography + Patterning Symposium has been the showcase of the latest advances in lithography and patterning technology for over four decades. The technology landscape keeps on ...

In lithography, pushing the limits of resolution is what we do. These efforts tend to get a lot of press. After all, the IC technology nodes are named after the smallest nominal dimensions printed ...

What is Block Copolymer Lithography? Block copolymer lithography is a nanofabrication technique that utilizes the self-assembly properties of block copolymers to create ordered nanostructures. Block ...

ST. FLORIAN, Austria and ZURICH, Oct. 9, 2017 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and ...

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical lithography, metrology, or EUV. Hear the latest advancements where leaders come to solve ...