SAN JOSE, Calif. — KLA-Tencor Corp. has rolled out its new reticle defect inspection system. Targeted for the 2x-nm logic (3x-nm half-pitch memory) node, the new Teron 600 platform brings programmable ...
May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
Pattern defects and contamination on a reticle can cause yield issues in every die of every wafer printed. We take it for granted today, but it started out with people looking through a microscope and ...
BILLERICA, Mass.--(BUSINESS WIRE)--Entegris, Inc. (NASDAQ: ENTG), a leader in specialty chemicals and advanced materials solutions for the microelectronics industry, today released the next generation ...
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