Plasma processing is one of the most frequently used processing methods in the manufacturing of electronic systems, especially for the production of microelectronics such as integrated circuits (ICs).

Microwave-Induced Plasma Optical Emission Spectrometry (MIP-OES) is an analytical technique that utilises microwave energy to generate a plasma, in which atoms and ions emit characteristic wavelengths ...

Nonthermal and thermal plasmas are used in the industrial, engineering, medical, and research industries. Plasma composition is an important parameter in any plasma process. Using optical emission ...

SPECTRO’s twin interface automatically combines both axial and radial plasma views—looking both across the plasma and from end to end. The SPECTROGREEN TI is the third and newest version of the ...

A team of researchers at the Institute of Laser Engineering, Osaka University, in collaboration with Bielefeld University and Technical University Braunschweig in Germany, came closer to unraveling ...

Researchers recently demonstrated a novel technique: plasma-grating-induced breakdown spectroscopy (GIBS). Laser-induced breakdown spectroscopy (LIBS) is a rapid chemical analysis tool. A powerful ...

UV, VIS & NIR Reflectometers & Spectroscopic Ellipsometers for semi-transparent thin film charcterisation; Optical Emission Spectroscopy (OES) systems; Plasma Monitoring & Process Control Systems The ...