Multi-beam mask writing was identified as one of the ways to eliminate hurdles to manufacturing curvilinear mask shapes in the last installment of this blog. Our blog series continues with an ...

Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

As the COVID-19 pandemic lingers, face masks, the strongest vaccine to the disease so far, have evolved in type, color and materials to offer a wider variety. New related items are also being ...

Some foundries require cut shapes to be aligned with respect to each other or to another layer. As shown in Figure 6, the Calibre Multi-Patterning tool automatically aligns the cut shapes between ...

In a new study, researchers used principal component analysis along with fluid dynamics simulation models to show the crucial importance of proper fit for all types of masks and how face shape ...

The semiconductor industry began using multi-patterning technology to fabricate ICs at the 20-nm process node. When we got to 7 nm, the use of self-aligned multi-patterning (SAMP) techniques was ...