TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...

Given that the alternatives all have challenges, it looks to me that optical lithography will have to deliver the 16 nm and most likely the 11 nm node. In my last blog, I reviewed the news from SPIE’s ...

Engineers at the NIST Center for Nanoscale Science and Technology (CNST) have developed a new technique for fabricating high aspect ratio three-dimensional (3D) nanostructures over large device areas ...

The semiconductor industry is rethinking the manufacturing flow for extreme ultraviolet (EUV) lithography in an effort to improve the overall process and reduce waste in the fab. Vendors currently are ...

Integrated optical signal distributing, processing, and sensing networks require the miniaturization of basic optical elements, such as waveguides, splitters, gratings, and optical switches. To ...

In a recent study published in Science, a group of Researchers at the University of Chicago, in collaboration with the Argonne National laboratory, have recently developed a novel method they termed ...

IBM develops an optical lithography technique capable of producing structures less than 32 nm in size which its says gives the industry seven years of breathing space. Scientists at IBM say they have ...

IBM announced last month that it had fabricated the smallest high-quality line patterns ever created by optical lithography. Jacqueline Hewett spoke to the researchers involved to find out how they ...

In the fifty years since Richard Feynman's eloquent assertion that there is Plenty of Room at the Bottom the world of nano-engineering has matured so that sophisticated systems can now be manufactured ...

(Nanowerk News) Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography (EBL), which makes patterns down to a few nanometers, is one of the fundamental pillars of ...