A technical paper titled “Quantified Uniformity and Selectivity of TiO 2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles” was published by researchers at IMEC, North ...
Tech Xplore on MSN
Joint research validates new semiconductor etching process, achieving five times speed improvement
A collaborative research team from Nagoya University and Tokyo Electron Miyagi Ltd. has demonstrated that the company's new ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback