TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...
As the optical lithography advances into the sub-30nm technology node, the various candidates of lithography have been discussed. Double dipole lithography (DDL) has been a primary lithography ...
Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...
Sematech and the Semiconductor Metrology Systems (SMS) division of Carl Zeiss claim to have reached a key development milestone in the development of a next generation photomask registration and ...
TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...
In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...
LEUVEN, BELGIUM: IMEC, in collaboration with JSR Corp. realized a simplified process using only one etch step to reduce the cost of double patterning. 32nm lines and spaces were printed with a double ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
We saw much more detail last week into European research consortium (they are here) IMEC’s 32 nm platform. One of the most revealing looks was into the tangle of decisions surrounding lithography for ...
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