(Nanowerk News) Scientists at the U.S. Naval Research Laboratory (NRL) have devised a clever combination of materials -- when used during the thin-film growth process -- to reveal that particle atomic ...
Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...
A group of scientists from Hanyang University has published a report reviewing and discussing the outlook of atomic layer deposition (ALD) based oxide semiconductor thin film transistors (TFTs). The ...